Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy

dc.contributor.ISNI0000 0001 2766 4681 (Thamban, PLS)
dc.contributor.ISNI0000 0000 5396 3610 (Goeckner, MJ)
dc.contributor.LCNA2008008261‏ (Goeckner, MJ)
dc.contributor.authorThamban, P. L. Stevenen_US
dc.contributor.authorPadron-Wells, Gabrielen_US
dc.contributor.authorHosch, Jimmy W.en_US
dc.contributor.authorYun, Stuarten_US
dc.contributor.authorGoeckner, Matthew J.en_US
dc.date.accessioned2013-01-16T16:35:48Zen_US
dc.date.accessioned2014-02-13T22:30:20Z
dc.date.available2013-01-16T16:35:48Zen_US
dc.date.available2014-02-13T22:30:20Z
dc.date.created2012-05-04en_US
dc.date.issued2012-10-03en_US
dc.description.abstractUse the DOI persistent link to see the abstract. A subscription or fee may be necessary to view the article.en_US
dc.description.versionFinal published versionen_US
dc.identifier.bibliographicCitationStephan Thamban, P. L., Stuart Yun, Gabriel Padron-Wells, Jimmy W. Hosch, and Matthew J. Goeckner. “Comparison Endpoint Study of Process Plasma and Secondary Electron Beam Exciter Optical Emission Spectroscopy.” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30, no. 6 (2012): 061303.en_US
dc.identifier.issn0734-2101en_US
dc.identifier.issue6en_US
dc.identifier.urihttp://hdl.handle.net/10735.1/3055
dc.identifier.volume30en_US
dc.publisherAmerican Vacuum Societyen_US
dc.relation.urihttp://dx.doi.org/10.1116/1.4756694
dc.rights© 2012 American Vacuum Societyen_US
dc.source.journalJournal of Vacuum Science & Technology Aen_US
dc.subjectOptical emission spectroscopyen_US
dc.subjectProcess plasmaen_US
dc.subjectElectron beamsen_US
dc.titleComparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopyen_US
dc.typeTexten_US
dc.type.genrearticleen_US

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