Photochemical CVD of Ru on Functionalized Self-Assembled Monolayers from Organometallic Precursors

dc.contributor.ISNI0000 0001 3758 9240 (Walker, AV)en_US
dc.contributor.ORCID0000-0003-3079-7367 (Salazar, B)en_US
dc.contributor.authorJohnson, K. R.en_US
dc.contributor.authorRodriguez, Paul Arevaloen_US
dc.contributor.authorBrewer, C. R.en_US
dc.contributor.authorBrannaka, J. A.en_US
dc.contributor.authorShi, Zhiweien_US
dc.contributor.authorYang, Jingen_US
dc.contributor.authorSalazar, Brianen_US
dc.contributor.authorMcElwee-White, L.en_US
dc.contributor.authorWalker, Amy V.en_US
dc.contributor.utdAuthorRodriguez, Paul Arevaloen_US
dc.contributor.utdAuthorShi, Zhiweien_US
dc.contributor.utdAuthorYang, Jingen_US
dc.contributor.utdAuthorSalazar, Brianen_US
dc.contributor.utdAuthorWalker, Amy V.en_US
dc.date.accessioned2018-08-20T16:22:52Z
dc.date.available2018-08-20T16:22:52Z
dc.date.created2016-12-19en_US
dc.date.issued2018-08-20
dc.descriptionIncludes supplementary materialen_US
dc.description.abstractChemical vapor deposition (CVD) is an attractive technique for the metallization of organic thin films because it is selective and the thickness of the deposited film can easily be controlled. However, thermal CVD processes often require high temperatures which are generally incompatible with organic films. In this paper, we perform proof-of-concept studies of photochemical CVD to metallize organic thin films. In this method, a precursor undergoes photolytic decomposition to generate thermally labile intermediates prior to adsorption on the sample. Three readily available Ru precursors, CpRu(CO)₂Me, (η³-allyl)Ru(CO)₃Br, and (COT)Ru(CO)₃, were employed to investigate the role of precursor quantum yield, ligand chemistry, and the Ru oxidation state on the deposition. To investigate the role of the substrate chemistry on deposition, carboxylic acid-, hydroxyl-, and methyl-terminated self-assembled monolayers were used. The data indicate that moderate quantum yields for ligand loss (φ ≥ 0.4) are required for ruthenium deposition, and the deposition is wavelength dependent. Second, anionic polyhapto ligands such as cyclopentadienyl and allyl are more difficult to remove than carbonyls, halides, and alkyls. Third, in contrast to the atomic layer deposition, acid-base reactions between the precursor and the substrate are more effective for deposition than nucleophilic reactions. Finally, the data suggest that selective deposition can be achieved on organic thin films by judicious choice of precursor and functional groups present on the substrate. These studies thus provide guidelines for the rational design of new precursors specifically for selective photochemical CVD on organic substrates.en_US
dc.description.sponsorshipNational Science Foundation (Grant Nos. CHE 1213546, DMR 1209547, DMR 1609081, and DMR 1608873).en_US
dc.identifier.bibliographicCitationJohnson, K. R., P. Arevalo Rodriguez, C. R. Brewer, J. A. Brannaka, et al. 2017. "Photochemical CVD of Ru on functionalized self-assembled monolayers from organometallic precursors." Journal of Chemical Physics 146(5), doi:10.1063/1.4971434en_US
dc.identifier.issn0021-9606en_US
dc.identifier.issue5en_US
dc.identifier.urihttp://hdl.handle.net/10735.1/5987
dc.identifier.volume146en_US
dc.language.isoenen_US
dc.publisherAmerican Institute of Physics Incen_US
dc.relation.urihttp://dx.doi.org/10.1063/1.4971434en_US
dc.rights©2016 The Authorsen_US
dc.source.journalJournal of Chemical Physicsen_US
dc.subjectAtomic layer depositionen_US
dc.subjectBromineen_US
dc.subjectChemical vapor depositionen_US
dc.subjectLigandsen_US
dc.subjectMonomolecular filmsen_US
dc.subjectOrganometallic compoundsen_US
dc.subjectQuantum theoryen_US
dc.subjectRutheniumen_US
dc.subjectThin filmsen_US
dc.subjectVapor-platingen_US
dc.subjectNucleophilic reactionsen_US
dc.subjectOrganic thin filmsen_US
dc.titlePhotochemical CVD of Ru on Functionalized Self-Assembled Monolayers from Organometallic Precursorsen_US
dc.type.genrearticleen_US

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