Gain and Loss Mechanisms for Neutral Species in Low Pressure Fluorocarbon Plasmas by Infrared Spectroscopy

dc.contributor.ISNI0000 0000 5396 3610 (Goeckner, MJ)
dc.contributor.ISNI0000 0003 5379 4329 (Overzet, LJ)
dc.contributor.LCNA2008008261‏ (Goeckner, MJ)
dc.contributor.authorNelson, Caleb T.en_US
dc.contributor.authorOverzet, Lawrence J.en_US
dc.contributor.authorGoeckner, Matthew J.en_US
dc.date.accessioned2014-02-13T19:39:56Z
dc.date.available2014-02-13T19:39:56Z
dc.date.created2012-8-21en_US
dc.description.abstractThis article examines the chemical reaction pathways of stable neutral species in fluorocarbon plasmas. Octafluorocyclobutane (c-C4F8) inductively coupled plasma discharges were found to primarily produce stable and metastable products downstream from the discharge, including c-C4F8, C2F4, C2F6, CF4, C3F8, C4F10, C3F6, and CF2. A novel analysis technique allows the estimation of gain and loss rates for neutral species in the steady state as functions of residence time, pressure, and discharge power. The gain and loss rates show that CF4, C2F6, C3F8, and C4F10 share related gain mechanisms, speculated to occur at the surface. Further analysis confirms that CF2 is predominantly produced at the chamber walls through electron impact dissociation of C2F4 and lost through gas-phase addition reactions to form C2F4. Additionally, time-resolved FTIR spectra provide a second-order rate coefficient of 1.8 x 10(-14) cm(3)/s for the gas-phase addition of CF2 to form C2F4. Finally, C2F4, which is much more abundant than CF2 in the discharge, is shown to be dominantly produced through electron impact dissociation of c-C4F8 and lost through either surface or gas-phase addition reactions.en_US
dc.identifier.citationNelson, Caleb T., Lawrence J. Overzet, and Matthew J. Goeckner. 2012. "Gain and loss mechanisms for neutral species in low pressure fluorocarbon plasmas by infrared spectroscopy." Journal of Vacuum Science & Technology A 30(5): 051308.en_US
dc.identifier.issn0734-2101en_US
dc.identifier.issue5en_US
dc.identifier.urihttp://hdl.handle.net/10735.1/3050
dc.identifier.volume30en_US
dc.relation.urihttp://dx.doi.org/10.1116/1.4746411en_US
dc.rights© 2012 American Vacuum Societyen_US
dc.source.journalJournal of Vacuum Science & Technology Aen_US
dc.subjectOptical spectroscopyen_US
dc.subjectSilicaen_US
dc.subjectElectron-electron interactionsen_US
dc.subjectElectric dischargesen_US
dc.subjectAddition reactionsen_US
dc.subjectFourier transform infrared spectroscopyen_US
dc.titleGain and Loss Mechanisms for Neutral Species in Low Pressure Fluorocarbon Plasmas by Infrared Spectroscopyen_US
dc.typetexten_US
dc.type.genrearticleen_US

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