Innovative SU-8 Lithography Techniques and Their Applications

DSpace/Manakin Repository

Innovative SU-8 Lithography Techniques and Their Applications

Show full item record

Title: Innovative SU-8 Lithography Techniques and Their Applications
Author(s):
Lee, Jeong Bong;
Choi, Kyung-Hak;
Yoo, Koangki
Item Type: article
Keywords: Show Keywords
Abstract: SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters) high-aspect-ratio (up to 100: 1) 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV) exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro-and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so.
ISSN: 2072-666X
Persistent Link: http://dx.doi.org/10.3390/mi6010001
http://hdl.handle.net/10735.1/4384
Terms of Use: CC-BY 4.0 (Attribution)
©2014 The Authors
Sponsors:

Files in this item

Files Size Format View
JECS-3861-271954.07.pdf 6.584Mb PDF View/Open Article

This item appears in the following Collection(s)


Show full item record

CC-BY 4.0 (Attribution) Except where otherwise noted, this item's license is described as CC-BY 4.0 (Attribution)