Accumulation Capacitance Frequency Dispersion of Ⅲ-Ⅴ Metal-Insulator-Semiconductor Devices due to Disorder Induced Gap States

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Accumulation Capacitance Frequency Dispersion of Ⅲ-Ⅴ Metal-Insulator-Semiconductor Devices due to Disorder Induced Gap States

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Title: Accumulation Capacitance Frequency Dispersion of Ⅲ-Ⅴ Metal-Insulator-Semiconductor Devices due to Disorder Induced Gap States
Author(s):
Galatage, R. V.;
Zhernokletov, Dmitry M.;
Dong, Hong;
Brennan, Barry;
Hinkle, Christopher L.;
Wallace, Robert M.;
Vogel, E. M.
Item Type: article
Keywords: Show Keywords
Abstract: The origin of the anomalous frequency dispersion in accumulation capacitance of metal-insulator-semiconductor devices on InGaAs and InP substrates is investigated using modeling, electrical characterization, and chemical characterization. A comparison of the border trap model and the disorder induced gap state model for frequency dispersion is performed. The fitting of both models to experimental data indicate that the defects responsible for the measured dispersion are within approximately 0.8nm of the surface of the crystalline semiconductor. The correlation between the spectroscopically detected bonding states at the dielectric/III-V interface, the interfacial defect density determined using capacitance-voltage, and modeled capacitance-voltage response strongly suggests that these defects are associated with the disruption of the III-V atomic bonding and not border traps associated with bonding defects within the high-k dielectric.
Publisher: American Institute of Physics Inc.
ISSN: 1089-7550
Persistent Link: http://dx.doi.org/10.1063/1.4886715
http://hdl.handle.net/10735.1/4144
Terms of Use: ©2014 AIP Publishing LLC

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