One-Step Combined-Nanolithography-And-Photolithography for a 2d Photonic Crystal TM Polarizer

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One-Step Combined-Nanolithography-And-Photolithography for a 2d Photonic Crystal TM Polarizer

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Title: One-Step Combined-Nanolithography-And-Photolithography for a 2d Photonic Crystal TM Polarizer
Author(s):
Choi, Kyung-Hak;
Huh, J.;
Cui, Yonghao;
Trivedi, Krutarth;
Hu, Walter;
Ju, B. -K;
Lee, Jeong-Bong
Item Type: article
Keywords: Photonic crystals
Silicon
Photolithography
Transverse magnetic polarizers
Description: Walter Hu is actually Wenchuang (Walter) Hu.
Abstract: Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.
Publisher: MDPI AG
ISSN: 2072-666X
Persistent Link: http://dx.doi.org/10.3390/mi5020228
http://hdl.handle.net/10735.1/4072
Terms of Use: CC-BY 3.0 (Attribution)

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CC-BY 3.0 (Attribution) Except where otherwise noted, this item's license is described as CC-BY 3.0 (Attribution)