Partially Fluorinated Oxo-Alkoxide Tungsten(VI) Complexes as Precursors for Deposition of WOx Nanomaterials

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Partially Fluorinated Oxo-Alkoxide Tungsten(VI) Complexes as Precursors for Deposition of WOx Nanomaterials

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Title: Partially Fluorinated Oxo-Alkoxide Tungsten(VI) Complexes as Precursors for Deposition of WOx Nanomaterials
Author(s):
Bonsu, R. O.;
Kim, H.;
O'Donohue, C.;
Korotkov, R. Y.;
McClain, K. R.;
Abboud, K. A.;
Ellsworth, Ashley A.;
Walker, Amy V.;
Anderson, T. J.;
McElwee-White, L.
Item Type: article
Keywords: WOx nanomaterials
Ligands
Chemical vapor deposition (CVD)
Tetramethylsilane
Abstract: The partially fluorinated oxo-alkoxide tungsten(VI) complexes WO(OR) 4 [4; R = C(CH3)2CF3, 5; R = C(CH3)(CF3)2] have been synthesized as precursors for chemical vapour deposition (CVD) of WOx nanocrystalline material. Complexes 4 and 5 were prepared by salt metathesis between sodium salts of the fluoroalkoxides and WOCl4. Crystallographic structure analysis allows comparison of the bonding in 4 and 5 as the fluorine content of the fluoroalkoxide ligands is varied. Screening of 5 as a CVD precursor by mass spectrometry and thermogravimetric analysis was followed by deposition of WOx nanorods.
Publisher: Royal Society of Chemistry
ISSN: 1477-9234
Persistent Link: http://dx.doi.org/10.1039/c4dt00407h
http://hdl.handle.net/10735.1/3997
Terms of Use: This article may not be further made available or distributed.
Sponsors: National Science Foundation (CHE-1213965)

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