Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy

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Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy

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title Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy
contributor.author Thamban, P. L. Steven
contributor.author Padron-Wells, Gabriel
contributor.author Hosch, Jimmy W.
contributor.author Yun, Stuart
contributor.author Goeckner, Matthew J.
contributor.ISNI 0000 0001 2766 4681 (Thamban, PLS)
contributor.ISNI 0000 0000 5396 3610 (Goeckner, MJ)
contributor.LCNA 2008008261‏ (Goeckner, MJ)
description.abstract Use the DOI persistent link to see the abstract. A subscription or fee may be necessary to view the article.
description.version Final published version
identifier.uri http://dx.doi.org/10.1116/1.4756694
identifier.uri http://hdl.handle.net/10735.1/3055
identifier.bibliographicCitation Stephan Thamban, P. L., Stuart Yun, Gabriel Padron-Wells, Jimmy W. Hosch, and Matthew J. Goeckner. “Comparison Endpoint Study of Process Plasma and Secondary Electron Beam Exciter Optical Emission Spectroscopy.” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30, no. 6 (2012): 061303.
subject Optical emission spectroscopy
subject Process plasma
subject Electron beams
date.created 2012-05-04
date.issued 2012-10-03
publisher American Vacuum Society
rights
rights.holder © 2012 American Vacuum Society
source Journal of Vacuum Science and Technology A

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