Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy

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Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy

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Title: Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy
Author(s):
Thamban, P. L. Steven;
Padron-Wells, Gabriel;
Hosch, Jimmy W.;
Yun, Stuart;
Goeckner, Matthew J.
Date Created: 2012-05-04
Format: Text
Item Type: Article
Keywords: Optical emission spectroscopy
Process plasma
Electron beams
Abstract: Use the DOI persistent link to see the abstract. A subscription or fee may be necessary to view the article.
Publisher: American Vacuum Society
Source: Journal of Vacuum Science and Technology A
Persistent Link: http://dx.doi.org/10.1116/1.4756694
http://hdl.handle.net/10735.1/3055
Bibliographic Citation: Stephan Thamban, P. L., Stuart Yun, Gabriel Padron-Wells, Jimmy W. Hosch, and Matthew J. Goeckner. “Comparison Endpoint Study of Process Plasma and Secondary Electron Beam Exciter Optical Emission Spectroscopy.” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30, no. 6 (2012): 061303.
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