Selective Atomic Layer Deposition with Electron-Beam Patterned Self-Assembled Monolayers

DSpace/Manakin Repository

Selective Atomic Layer Deposition with Electron-Beam Patterned Self-Assembled Monolayers

Show simple item record

title Selective Atomic Layer Deposition with Electron-Beam Patterned Self-Assembled Monolayers
contributor.author Huang, Jie
contributor.author Lee, Mingun
contributor.author Kim, Jiyoung
contributor.VIAF 70133685 (Kim, J)
description.abstract The authors selectively deposited nanolines of titanium oxide (TiO(2)) through atomic layer deposition (ALD) using an octadecyltrichlorosilane (OTS) self-assembled monolayer (SAM) as a nucleation inhibition layer. Electron-beam (e-beam) patterning is used to prepare nanoline patterns in the OTS SAM on SiO(2)/Si substrates suitable for selective ALD. The authors have investigated the effect of an e-beam dose on the pattern width of the selectively deposited TiO(2) lines. A high dose (e. g., 20 nC/cm) causes broadening of the linewidth possibly due to scattering, while a low dose (e. g., 5 nC/cm) results in a low TiO(2) deposition rate because of incomplete exposure of the OTS SAMs. The authors have confirmed that sub-30 nm isolated TiO(2) lines can be achieved by selective ALD combined with OTS patterned by EBL at an accelerating voltage of 2 kV and line dose of 10 nC/cm. This research offers a new approach for patterned gate dielectric layer fabrication, as well as potential applications for nanosensors and solar cells.
identifier.issn 0734-2101
identifier.uri http://hdl.handle.net/10735.1/2801
identifier.bibliographicCitation Huang, Jie, Mingun Lee, and Jiyoung Kim. 2012. "Selective atomic layer deposition with electron-beam patterned self-assembled monolayers." Journal of Vacuum Science & Technology A 30(1): 01128-01A128.
identifier.volume 30
identifier.issue 1
identifier.startpage 1128
subject Titanium dioxide
subject Electron beams
subject Silica
date.created 2011-12-02
relation.uri http://dx.doi.org/10.1116/1.3664282
rights © 2012 American Vacuum Society
source.journal Journal of Vacuum Science and Technology A

Files in this item

Files Size Format View
ECS-FR-JKim-310521.8.pdf 1.384Mb PDF View/Open

This item appears in the following Collection(s)


Show simple item record